The global semiconductor industry has entered a stage of rapid technological iteration and capacity expansion in 2026. Driven by artificial intelligence, autonomous driving, industrial Internet and high-end consumer electronics, the market demand for advanced process chips, silicon carbide and gallium nitride third-generation semiconductor devices continues to surge. Wafer manufacturing, high-temperature epitaxial growth and plasma etching are the core links of chip production, and the high-temperature thermal field environment of these processes directly determines the yield and performance consistency of semiconductor chips. Ultra-high-purity graphite components are the key structural and thermal conduction materials to build a stable high-temperature thermal field in chip manufacturing equipment, and their performance indicators directly affect the production quality of high-end chips.
Different from nuclear-grade and industrial-grade graphite, semiconductor-grade graphite has reached the top level of global material purity standards. The total impurity content must be controlled below 3ppm, and the content of heavy metal ions such as iron, copper and sodium that easily cause chip circuit pollution must be lower than 0.1ppm. Trace metal impurities will form micro-defects on the wafer surface during high-temperature chip manufacturing, damage the precision circuit structure of the chip, and lead to chip performance degradation and scrap. In addition, semiconductor graphite components need to maintain ultra-high dimensional stability and thermal uniformity in a high-temperature environment above 1400℃ for a long time, with zero thermal deformation and uniform heat conduction, to ensure the consistency of each batch of wafer production.
At present, the global high-end semiconductor-grade graphite market has long been monopolized by a small number of Japanese and European enterprises. The ultra-deep purification technology of graphite raw materials, precise molding and processing technology of large-size graphite components, and high-temperature anti-pollution modification technology have formed a solid technical barrier. Most graphite enterprises can only produce ordinary high-purity graphite materials and cannot meet the extreme anti-pollution and high stability requirements of semiconductor manufacturing scenarios. In recent years, with the global shortage of chip capacity and the rapid expansion of third-generation semiconductor production lines, the supply gap of semiconductor-grade graphite components has continued to expand, becoming an important factor restricting the expansion of global high-end chip production capacity.
The technical difficulty of semiconductor-grade graphite lies in the whole-process pollution-free control and micro-precision processing. In the raw material purification stage, it is necessary to remove trace inorganic impurities and metal ions that are difficult to eliminate by traditional processes. In the sintering and forming stage, ultra-high-temperature inert atmosphere sintering is required to avoid secondary pollution of materials. In the processing stage, micron-level precision processing is needed to ensure the assembly accuracy of large-size graphite thermal field components. Any slight process deviation will lead to unqualified product indicators and cannot be applied to high-end semiconductor production lines.
Facing the global supply bottleneck of semiconductor-grade graphite materials, Jincheng Graphite has focused on the semiconductor high-end material track for many years, and successfully broken the international technical monopoly through continuous independent R&D and process innovation. The enterprise has built a dust-free constant-temperature purification production workshop specially for semiconductor graphite materials, and adopted a self-developed multi-stage composite purification process, which accurately removes trace metal impurities and inorganic pollutants in graphite raw materials. The total impurity content of the produced semiconductor-grade graphite materials is stably controlled below 2.8ppm, and the heavy metal ion content is lower than 0.08ppm, exceeding the international industry standard.
In terms of component processing and performance optimization, Jincheng Graphite has independently developed high-precision molding and low-pollution processing technology for semiconductor graphite thermal field parts. The enterprise can customize and produce various core semiconductor graphite components including graphite boats, graphite heaters, thermal insulation cylinders and epitaxial furnace graphite liners. The products have ultra-low thermal deformation rate and excellent thermal uniformity, and can operate stably in ultra-high-temperature semiconductor production environments for a long time without pollution. After long-term verification by international semiconductor equipment manufacturers, the product performance is completely comparable to imported high-end products.
In order to adapt to the customized production needs of global semiconductor equipment, Jincheng Graphite has built a full-process industrial chain from raw material purification, precision molding, micro-processing to surface anti-pollution treatment. The enterprise has perfect batch production capacity and quality traceability system, which can realize stable supply of large-size and special-shaped semiconductor graphite components. At present, Jincheng Graphite's semiconductor-grade graphite products have passed the authoritative certification of global semiconductor material testing institutions, and have entered the supply chain of many international semiconductor equipment manufacturers and wafer fabs, effectively alleviating the global shortage of high-end semiconductor graphite materials.
Industry authoritative forecast data shows that with the continuous expansion of global advanced chip process capacity and third-generation semiconductor industrial scale, the global semiconductor-grade graphite market size will exceed 3.8 billion US dollars by 2028, with a compound annual growth rate of 14.7%. As a rising leading supplier in the global semiconductor graphite field, Jincheng Graphite will continue to deepen technological innovation, optimize product precision and purity indicators, expand customized production capacity, and provide high-quality and reliable core material support for the high-quality development of the global semiconductor industry.
