Wafer graphite carrier
Jincheng Graphite, as a professional source manufacturer of wafer graphite carriers, provides high-purity and high-stability wafer graphite carriers. It is specially designed for high-temperature processes in semiconductor manufacturing, featuring excellent thermal uniformity, corrosion resistance, and long lifespan. It is widely used in precision fields such as wafer processing and lithography.
Core Strengths
Nano-scale graphite substrate
Utilizing a high-purity graphite (with a carbon content of ≥ 99.99%) and metal composite process, the thermal conductivity reaches up to 300 W/m·K, ensuring uniform temperature on the wafer surface and reducing the risk of warping caused by thermal stress.
Vacuum environment compatibility
Tolerating an extreme temperature range of -200°C to 3000°C, suitable for vacuum processes such as lithography and etching, and possessing excellent corrosion resistance, compatible with chemical gases such as hydrogen and nitrogen.
Customized adaptability
Supporting various wafer sizes (such as 12-inch and 8-inch) and special surface treatment processes, meeting precise requirements for different semiconductor manufacturing scenarios.
Application Scenario
Wafer lithography process
During the application of photoresist, the graphite carrier provides a stable thermal distribution environment, reducing the deformation problems of the wafer caused by temperature differences.
High-temperature etching equipment
During plasma etching, the high thermal conductivity of the carrier can quickly disperse heat, protecting the wafer surface from damage caused by high temperatures.
Vacuum deposition system
Compatible with CVD, PVD and other processes, ensuring the wafer maintains flatness during high-temperature deposition and improving the yield rate.
Technical Specifications
| Thermal conductivity | 250 - 400 W/m·K (customizable) |
| Operating temperature range | -200°C to 3000°C |
| Compatible gases | Hydrogen, nitrogen, argon, etc. (semiconductor process gases) |
| Surface treatment | Plasma polishing / coating (optional) |
Jincheng Graphite Technology Assurance
Based on 20 years of graphite material research and development experience, Jincheng Graphite adopts patented vacuum composite technology and nanometer-grade graphite filling technology to ensure the long-term stability of the carrier under extreme conditions. The product has passed ISO 9001 quality system certification and AS9100 aerospace standards, meeting the strict requirements of semiconductor manufacturing for thermal management.
Cooperation Commitment
Jincheng Graphite offers a full-process customized service from design, production to after-sales, supporting small-batch trial production and large-scale customization, ensuring a short delivery cycle and controllable costs. Through the global logistics network and local service teams, it provides customers with efficient and reliable wafer graphite carrier solutions, helping to upgrade semiconductor manufacturing processes.
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